Orientation-Dependent Etch Rate of Single Crystal Silicon Related to Etching Temperature.
نویسندگان
چکیده
منابع مشابه
Crystallographic Orientation Dependent Reactive Ion Etching in Single Crystal Diamond.
Sculpturing desired shapes in single crystal diamond is ever more crucial in the realization of complex devices for nanophotonics, quantum computing, and quantum optics. The crystallographic orientation dependent wet etch of single crystalline silicon in potassium hydroxide (KOH) allows a range of shapes to be formed and has significant impacts on microelectromechanical systems (MEMS), atomic f...
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Anisotropic orientation dependent etching has been used extensively in the formation of silicon-based micro structures. The technique exploits differences between the etch rates of the low index crystallographic planes for some wet chemical etchants. In particular, solutions of KOH in water have been shown to etch jIll! planes up to several hundred times more slowly than (110) and 11001 planes...
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ژورنال
عنوان ژورنال: Journal of the Japan Society for Precision Engineering
سال: 1995
ISSN: 1882-675X,0912-0289
DOI: 10.2493/jjspe.61.547